The aligner
Mutech microsystems microAligner is a compact high value UV mask aligner designed for microfabrication applications.
It allows for easy fabrication of multilayer devices on a multitude of photoresists, with excellent exposure quality.
The easy to use, 7 inch touchscreen based control allows the user to align using the calibrated digital microscope and the X-Y-R micrometer based alignment stage.
The fully electronic wafer pressure and gap control allows for easy alignment and very high repeatability of the exposure conditions between processes.
Main applications
microAligner is ideal for the fabrication of high level systems for research applications.
Main applications range from microfluidics, optics and biotechnology to microelectronic devices.
It provides the user with fast multilayer device fabrication capabilities thanks to its high resolution and high accuracy alignment.
Dual microscope option
We are also offering a dual microscope version of our mask aligner for rapid aligning of big photomasks.
With this option the operator has access to two video feeds on the screen in real time while aligning, allowing the user to easily align two fiducial marks at once, simplifying the alignment process.
Advantages
365nm LED source
Big exposure area
Big exposure area
A LED source allows for instant turn-on, excellent homogeneity, low divergence and very long life.
Big exposure area
Big exposure area
Big exposure area
With the 100mm diameter UV aperture, you can expose up to 4" wafers with 5" photomasks.
Low footprint
Big exposure area
Electronic pressure and gap control
The microAligner footprint is only 350x490 mm and weighs less than 20kg.
Electronic pressure and gap control
Electronic pressure and gap control
Electronic pressure and gap control
The wafer stage is electronically controlled with real time pressure sensing, allowing for excellent repeatability.
Digital microscope
Electronic pressure and gap control
Lower price than the competition
The digital microscope includes a 590nm coaxial yellow illumination and it is used from the screen.
Lower price than the competition
Electronic pressure and gap control
Lower price than the competition
We have managed to keep the prices low allowing you to have a better lab on a tight budget.
Controls
7" Touchscreen
The μAligner is primarily controlled from its 7 inch capacitive touchscreen.
From here the user has access to all the controls of the machine, the microscope controls and video feed, exposure parameters, wafer stage controls and mask vacuum.You have access to a real time wafer Z position and wafer pressure signals to allow for maximum repeatability.
Mechanics
The wafer Z position is controlled with a big 60 mm rotary encoder for maximum control. The user controls the wafer alignment to the mask using the X-Y-R stage with the mechanical micrometers.
The microscope can be freely moved by the user around the photomask to look for alignment marks.
Combine it with our direct laser system for maximum capabilities
Our direct laser lithography system, the microLaser, allows the user to fabricate its own optical masks, offering an increased versatility.
The microAligner system, as a complementary tool of the microLaser, offers the possibility to work with 365 nm sensitive photoresists and high accuracy alignment capabilities to obtain high aspect ratio structures and a high throughput on the lithography process.
These possibilities make the microAligner and microLaser package the ultimate solution for the fast fabrication and development of multilayered device applications including biomedical, microfluidics and microelectronic devices.
Specs
X-Y-R Aligning stage
Type of control Mechanical, micrometer based
Accuracy 1 µm
X-Y alignment span 6 mm
R alignment span 5º
Z Wafer stage
Type of control Motorized
Stage step 0.31 µm/step
Pressure sensing resolution 20 g
Maximum pressure 5 kg
- 60 mm rotary encoder for precise gap/pressure control.
- Wafer pressure sensing with live feedback for high repeatability between processes.
- Interchangeable vacuum based photomask holders for 2”, 3”, 4”, 5” square photomasks and microscope slides.
UV Optics
Wavelength 365 nm
Exposure time 0.1 - 200 s
Exposure area 100 mm diameter
Power density 0.2 - 20 mW/cm^2
Homogeneity < 5%
Light divergence < 3°
- Motorized motion between aligning and exposure modes
Microscope
Camera resolution 1920x1080
Auxiliary illumination 590nm coaxial yellow LED
Field illumination mode Clear field illumination
Alignment technique Top-side alignment, single camera
Motion 3 axis, independent XYZ manual stage
Objective Effective magnification on screen
Low mag 90x
Medium mag 315x
High mag 480x
Electronics
Display 7” full color LCD
User control Capacitive touchscreen for machine controls and microscope
- 32 Bits ARM cortex based integrated computer for maximum compactness.
Mechanics
Size 350x490x470 mm
Weight 19 kg
Power 110v/220v 250W